| Name of the Equipment | 4 inch RCA Clean Station |
| Category | clean (for si) |
| Operator | Shilpa Kharat Shahiroze Khetani Arpit Mishra |
| System Owner | Minita Surwade (NH) minita@iitb.ac.in Shahiroze Khetani 30005034@iitb.ac.in |
| Short Name | |
| Make | Laxmi Instruments/ NA |
| Model | |
| Serial Number | 200801132 (P O numbe |
| FootPrint | |
| InstallationDate | |
| Equipment Type | Bonding tools |
| Location | 6 |
| AMC | Required |
| Local Dealer | Rupesh Khule 07208246450(for DI water system) |
| Actual Dealer | Nil Nil |
| SOP | SOP/183_SOP.rar |
| Training & other policy documents | POLICY/183_POLICY.pdf |
| Recipies | RECEPIES/183_RECEPIES.pdf |
| Glimpse | GLIMPSE/183_GLIMPSE.pdf |
| Tool Facilities Requirements | DI water, Hot plate |
| Access | Open |
| Lab Phone No | 4464 |
| Substrate allowed | Si |
| Substrate Dimension | Maximum 4 inch Si wafers |
| Material allowed | Only RCA chemicals and DI water |
| Chemical allowed | Ammonium Hydroxide, H2O2, HCl, HF, DI water |
| Elements allowed | |
| Target allowed | NA |
| Target dimension | NA |
| Gases allowed | PN2 for drying |
| Contamination remarks | No other chemicals allowed. No glasswares allowed. Only teflon and quartz is allowed. Sodium and potassium contamination strictly prohibited. |
Equipment Details |
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