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| Total no. 384 |
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| 1 | P. Samanta, C. L. Cheng, and Y. J. Lee, "Charge trapping related degradation of thin HfAlO/SiO2 gate dielectric stack during constant voltage stress," J. Electrochem. Soc., vol. 156, pp. H661, 2009 |
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| 2 | P. Samanta, C. L. Cheng, Y. J. Lee and M. Chan, "Mechanism of positive charge generation in the bulk of HfAlO/SiO2 stack," Microelectronic Engg. vol. 86, pp. 1767, 2009 |
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| 3 | P. Samanta, C. L. Cheng, Y. J. Lee and M. Chan, "Electrical stress-induced charge carrier generation / trapping and related degradation of HfAlO/SiO2 and HfO2/SiO2 gate dielectric stacks," J. Applied Physics, vol. 105, pp. 124507, 2009 |
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| 4 | S. Thomas, S H Al-Harthi, I A Al-Omari, R V Ramanujan, V Swaminathan and M R Anantharaman, "Influence of substrate topography on the growth and magnetic properties of obliquely deposited amorphous nanocolumns of Fe-Ni," J. Physics D. Applied Physics, vol. 42, pp. 215005, 2009 |
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