Publications (Inup Phase 1 and 2)


Total no. 323
1A. G. Khairnar and Ashok M. Mahajan, "Effect of post-deposition annealing temperature on RF-Sputtered HfO2 thin film for advanced C MOS technology", Accepted in Solid State Sciences. (DOI: http://dx.doi.org/10.1016/j.solidstatesciences.2012.09.010)
2 B. N. Joshi, Y. S. Mhaisagar and A. M. Mahajan, "Analysis of interconnect capacitance for sub nano CMOS technology using the low dielectric material," Microelectronics Reliablity, vol. 51, issue 5, pp. 953 - 958, 2011
3K. Panchal, D. K. Rai, M. Mathew and C. S. Solanki, "a-Si/SiNx multilayered light absorber for solar cell," J. of Nanoparticle Research, vol. 13, Issue 6, pp. 2469-2473, 2011
4A.Kshirsagar, S. P. Duttagupta and S. A. Gangal, "Optimization and Fabrication of Low Stress, Low Temperature Silicon Oxide Cantilevers," J. of Micro-Nano Letters, vol. 6 (7), pp. 476-481, 2011.
5A. K. Jha, N.Khare and R. Pinto, "Enhanced flux pinning in pulsed laser deposited YBa2Cu3O7− δ :BaTiO3 nanocomposite thin films", Solid State Comm., vol. 151, pp. 1447-1551, 2011
6A. K. Jha, N.Khare and R. Pinto, "Interface engineering using ferromagnetic nanoparticles for enhancing pinning in YBa2Cu3O7-δ thin films," J. of Applied Physics, vol. 110, pp 113920 (1-7), 2011
7A. K. Jha, N.Khare and R. Pinto, "Comparison of flux pinning mechanism in laser ablated YBCO and YBCO:BaZrO3 nanocomposite thin films," J. of Superconductivity and Novel Magnetism, vol. 25, pp. 377-380, 2011(DOI 10.1007/s10948-011-1321-3)
8A. K. Jha, N. Khare and R. Pinto, "Enhanced critical current density in YBa2Cu3O7-δ thin films deposited on La0.67Sr0.33MnO3 decorated SrTiO3 substrates," Physica C: Superconductivity, Vol. 471, Issues 21 - 22, pp. 1154 - 1157, 2011
9N.S. Ramgir, M. Ghosh, P. Veerender, N. Datta, M. Kaur, D.K. Aswal and S.K. Gupta, "Growth and gas sensing characteristics of p- and n-type ZnO nanostructures," Sensors and Actuators B: Chemical, vol. 156, Issue 2, pp. 875-880, 2011(http://dx.doi.org/10.1016/j.snb.2011.02.058)
10K. C. Narasimhamurthy and R.Paily, "Fabrication and characterization of high performance and high-current back gate thin-film field-effect transistors using sorted single-walled carbon nanotubes", IET Circuits, Devices and Systems, vol. 5 (5), pp. 365-370, 2011(doi: 10.1049/iet-cds.2010.0424)
11K. C. Narasimhamurthy and R.Paily, "Performance Comparison of Interdigitated Thin-Film Field-Effect Transistors using Different Purity Semiconducting Carbon Nanotubes," Advanced Materials Research, vol. 181-182, pp. 343-348, 2011(doi:10.4028/www.scientific.net/AMR.181-182.343)
12K. C. Narasimhamurthy and R.Paily, "High Performance Local Back Gate Thin-Film Field-Effect Transistors using Sorted Carbon Nanotubes on Amino-Silane Treated Hafnium-Oxide Surface," Semiconductor Science and Technology, vol. 26, 2011(doi:10.1088/0268-1242/26/7/075002)
13K. C. Narasimhamurthy and R.Paily, "Performance Comparison of Single Gate and Dual Gate Carbon Nanotube Thin-Film Field-Effect Transistors," IEEE Trans. on Electron Devices, vol.58, pp. 1922-1927, 2011
14P.M. Tirmali, A. G. Khairnar, B. N. Joshi and A.M. Mahajan, "Structural and electrical characteristics of RF-sputtered HfO2 high-k based MOS capacitors," Solid State Electronics, vol.62, pp. 44 - 47, 2011
15S. Roy, T. Majhi, A.Kundu, C. K. Sarkar and H. Saha, "Design, Fabrication and simulation of coplanar microheater using Nickel alloy for low temperature gas sensor applications," Sensor Letters, in press
16V. Singh, N. Shashank , D. Kumar and R. K. Nahar, "Effect of Heavy Ion Irradiation on the Electrical Properties of rf-Sputtered HfO2 Thin Films for Advanced CMOS Devices," Radiation Effects and Defects in Solids, 2011
17V. Singh, N. Shashank, D. Kumar and R. K. Nahar, "Frequency dependence studies on the interface trap density and series resistance of HfO2 gate dielectric deposited on Si substrate: Before and after 50MeV Li3+ ions irradiation," Nuclear Inst. and Methods in Physics Research, vol. 269, pp. 2765 - 2770, 2011
18Y. S. Mhaisagar, B. N. Joshi and A. M. Mahajan, "Deposition and Surface Modification of Low-k Thin Films for ILD Application in ULSI Circuits," J. Nano- Electron. Phys. 3 No1, P.106-110, 2011
19A. Rammohan, Prabhat K Dwivedi, R. Martinez-Duarte, Hari Katepali, Marc J. Madou and A. Sharma, "One-step maskless grayscale lithography for the fabrication of 3-dimensional structures in SU-8," Sensors & Actuators B: Chemical, vol. 153, pp. 125-134, 2011
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